Carbon films on SiC have many applications, ranging from tribology to electrical energy storage. Formation of epitaxial or heteroepitaxial layers of carbon on SiC by “soft solution process,” such as electro- or photochemical ones, is attractive for various fields of application, decreasing the energy consumption and making the process compatible with electronic device fabrication. We have demonstrated formation of a carbon layer on SiC ceramics by electrochemical etching in a nonaqueous electrolyte. The selective etching of Si from SiC in a single step reaction with hydrofluoric acid (HF) in different organic solvents has been carried out and the role of polarity, surface tension, density, and viscosity of the organic solvents in the formation of the carbon layer has been investigated. 

The solution of 1:4.6 ratio hydrofluoric acid (HF) and ethanol at low current densities (10 and 20 mA/cm2) allows the best control over selective etching of Si forming amorphous and ordered carbon on the SiC surface. The presence of an intense G band of graphitic carbon in Raman spectra and high resolution transmission electron microscopy analysis indicate formation of ordered carbon on the surface of SiC. X-ray diffraction shows that the etching rate of α-SiC is much higher when compared to β-SiC.

The clinical data of patients, male, 27 years old, a chemical plant workers. September 28, 1989 36% hydrofluoric acid burns right leg, the contact time is about 3 ~ 4s. After injury he immediately wash the wound with tap water 30min, followed by washing with 0.25% ammonia 5min, and intravenous injection of 10% calcium gluconate 10ml, 4h admission. Right leg burn area was 10%, deep Ⅱ degree, in addition to local swelling and oozing burning no other discomfort. Blood calcium was 1.49mmol / L. After admission, routine antibiotic therapy, wound with Ca ~ (2 +) - Mg ~ (2+) suspension (the formula is: magnesium sulfate 35g, calcium chloride 60g, 5% sodium bicarbonate 250ml.